EVR116 Motorized Gas Control Valves
♥ Model: EVR116
♥ Stock: 1-3pcs (IN STOCK)
♥ Shelf life: 12 months
♥ Product Status: Original Genuine
♥ supply: available from HONG KONG SAUL ELECTRICAL LIMITED

Categories: Others, PLC DCS In stocks
EVR116 Motorized Gas Control Valves
EVR116
Product Description
The Pfeiffer EVR116 is a motorized gas control valve designed for precise pressure control in vacuum systems. It’s a critical component in various high-tech and industrial applications where accurate gas flow management is essential.
The EVR116 is part of Pfeiffer Vacuum’s range of high-quality vacuum components. It operates by adjusting a needle to control the gas flow into or out of a vacuum chamber, thereby regulating the pressure. Its motorized actuator ensures fine and repeatable control, making it suitable for demanding processes.
Technical Specifications (Typical for EVR116)
- Type: Gas control valve, motorized
- Flange Type: DN 16 ISO-KF
- Control: RVC 300 or IF 200 (external control unit)
- Control Voltage: 0-10 V DC
- Supply Voltage: 24 V DC
- Max. controllable gas flow: 1.25⋅103 mbar l/s
- Min. controllable gas flow: 5⋅10−6 mbar l/s
- Operating pressure range: 1⋅10−8 mbar to 2.5 bar (absolute)
- Tightness: 1⋅10−9 mbar l/s
- Closing/opening time: < 3 / 4 s
- Ambient temperature: 5 – 40 °C
- Bakeout temperature (actuator/housing): 60 °C / 80 °C
- Materials: Stainless steel (housing, needle, filter), FPM (seal), Fluoroplastomer (dosing sleeve)
- Weight: Approximately 0.5 – 0.75 kg

EVR116
The Pfeiffer EVR116 is used in a wide range of applications that require precise and automated vacuum pressure control, including:
- ► Semiconductor manufacturing: For process gas delivery and pressure regulation in deposition, etching, and other vacuum-dependent processes.
- ► Research and development: In laboratories for various vacuum experiments, thin film deposition, and material science.
- ► Analytical instruments: Such as mass spectrometers and electron microscopes, where precise pressure control is vital for instrument performance.
- ► Analytical instruments: Such as mass spectrometers and electron microscopes, where precise pressure control is vital for instrument performance.
- ► Industrial vacuum processes: Any application requiring stable and controlled pressure environments.

Key Features and Functions:
- Precise Gas Flow Control: The EVR116 offers a very large control range, allowing for precise regulation of gas flow from very low rates (down to 5⋅10−6 mbar l/s) to high throughputs (up to 1.25⋅103 mbar l/s). This wide range makes it versatile for different vacuum processes.
- Motorized Actuator: Unlike manual or pneumatic valves, the EVR116 features an integrated motor drive electronics that translates a control signal (typically 0-10 V DC) into a defined valve position. This provides automated, accurate, and repeatable control.
- Vacuum System Pressure Regulation: It’s primarily used for controlling pressure in a vacuum system. This can be achieved through:
- Up-stream control: Varying the gas flow into the vacuum system.
- Down-stream control: Varying the conductance (or pumping speed) out of the vacuum system.
- Fast Response Time: With closing and opening times of less than 3-4 seconds, it can quickly respond to changes in control signals, maintaining stable process conditions.
- Robust Construction: The valve housing, needle, and filter are made of stainless steel, and the seals are typically FKM (Fluoroplastomer), ensuring durability and compatibility with various gases in a vacuum environment.
- Compatibility with Control Units: The EVR116 is designed to work seamlessly with Pfeiffer Vacuum’s control units, such as the RVC 300 or IF 200, providing a comprehensive solution for vacuum pressure control.
- Bakeout Capability: It has specific bakeout temperatures (actuator up to 60 °C, housing up to 80 °C), allowing for the removal of adsorbed gases and contaminants, which is crucial for achieving ultra-high vacuum (UHV) conditions.
- Standard Flange Connection: It typically comes with a DN 16 ISO-KF flange, a common standard in vacuum technology, ensuring easy integration into existing vacuum systems.
